System for cleaning semiconductor wafers

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11141762
APP PUB NO 20180071794A1
SERIAL NO

15814242

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Abstract

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A system for controlling damages in cleaning a semiconductor wafer comprising features of patterned structures, the system comprising: a wafer holder for temporary restraining a semiconductor wafer during a cleaning process; an inlet for delivering a cleaning liquid over a surface of the semiconductor wafer; a sonic generator configured to alternately operate at a first frequency and a first power level for a first predetermined period of time and at a second frequency and a second power level for a second predetermined period of time, to impart sonic energy to the cleaning liquid, the first predetermined period of time and the second predetermined period of time consecutively following one another; and a controller programmed to provide the cleaning parameters, wherein at least one of the cleaning parameters is determined such that a percentage of damaged features as a result of the imparting sonic energy is lower than a predetermined threshold.

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Patent Owner(s)

Patent OwnerAddress
ACM RESEARCH (SHANGHAI) INCBUILDING 4 NO 1690 CAI LUN ROAD CHINA (SHANGHAI) PILOT FREE TRADE ZONE PUDONG NEW AREA SHANGHAI 201203 201203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Fufa Cupertino, US 30 893
Chen, Fuping Shanghai, CN 45 43
Jia, Zhaowei Shanghai, CN 38 48
Jin, Yinuo Shanghai, CN 21 23
Li, Xuejun Shanghai, CN 57 510
Wang, Hui Fremont, US 1115 8921
Wang, Jian Shanghai, CN 1906 17240
Wang, Jun Shanghai, CN 2215 18848
Wang, Xi Shanghai, CN 356 3114
Xie, Liangzhi Shanghai, CN 33 68
Zhang, Xiaoyan Shanghai, CN 147 1153

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