Neutral radical etching of dielectric sacrificial material from reentrant multi-layer metal structures
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United States of America
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Dec 28, 2021
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Apr 10, 2019
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Apr 10, 2019
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Abstract
Embodiments are directed to forming reentrant multi-layer micro-scale or millimeter scale three dimensional structures, parts, components, or devices where each layer is formed from a plurality of deposited materials and more specifically where each layer is formed from at least one metal structural material and at least one organic sacrificial material (e.g. polymer) that are co-planarized and a portion of the sacrificial material located on a plurality of layers is removed after formation of the plurality of layers via one or more plasma etching operations or one or more neutral radical etching operations.
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