Methods for cleaning semiconductor device manufacturing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11211232
APP PUB NO 20200135435A1
SERIAL NO

16398667

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Abstract

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The present disclosure describes a chuck-based device and a method for cleaning a semiconductor manufacturing system. The semiconductor manufacturing system can include a chamber with the chuck-based device configured to clean the chamber, a loading port coupled to the chamber and configured to hold one or more wafer storage devices, and a control device configured to control a translational displacement and a rotation of the chuck-based device. The chuck-based device can include a based stage, one or more supporting rods disposed at the base stage and configured to be vertically extendable or retractable, and a padding film disposed on the one or more supporting rods.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTDNO 8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-77

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Che-fu Taipei, TW 37 27
Hsieh, Ian Hsinchu, TW 10 11
Liu, Yan-Hong Zhudong Township, TW 34 90

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