Polishing composition, method for producing same, and polishing method

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11214711
APP PUB NO 20180355212A1
SERIAL NO

15579844

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Abstract

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The present invention is a polishing composition, containing zirconium oxide as abrasive grains, the polishing composition having pH of 11.0 or more and less than 12.5, the zirconium oxide having element concentrations of sodium, magnesium, aluminum, potassium, calcium, titanium, chromium, iron, manganese, nickel, copper, zinc, lead, and cobalt of less than 1 ppm each. There can be provided a polishing composition that enables semiconductor substrates having high flatness not only in the inner circumferential portion but also in the outer circumferential portion with little contamination due to metal impurities to be obtained at high productivity.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDTOKYO 100-0005

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nojima, Yoshihiro Annaka, JP 27 54
Takahashi, Mitsuhito Annaka, JP 22 40

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