Treatment liquid, method for washing substrate, and method for removing resist

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United States of America

PATENT NO 11225633
APP PUB NO 20190071623A1
SERIAL NO

16180107

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Abstract

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A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0×10−10 to 1.0×10−4.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATIONTOKYO 106-8620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kamimura, Tetsuya Haibara-gun, JP 159 522
Takahashi, Tomonori Haibara-gun, JP 121 1303

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