CMP slurry compositions and methods of fabricating a semiconductor device using the same

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United States of America

PATENT NO 11279852
APP PUB NO 20210130651A1
SERIAL NO

16912426

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Abstract

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Described herein are chemical mechanical polishing (CMP) slurry compositions, such as CMP slurry compositions for polishing an indium tin oxide (ITO) layer, along with methods of fabricating a semiconductor device using such a CMP slurry composition. The CMP slurry composition can include a polishing particle, a dispersing agent, an auxiliary oxidizing agent, and a sugar alcohol compound.

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Patent Owner(s)

  • SAMSUNG ELECTRONICS CO., LTD.; KCTECH CO.. LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hwang, Jun Ha Anseong-si, KR 18 60
Kim, Bo Yun Hwaseong-si, KR 13 38
Kim, Dongchan Seongnam-si, KR 97 280
Kwon, Chang Gil Anseong-si, KR 6 26
Lee, Sung Pyo Anseong-si, KR 12 37
Seo, Eunsung Hwaseong-si, KR 19 119

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