Photomask

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11281091
APP PUB NO 20200089099A1
SERIAL NO

16694348

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A photomask includes a patterned photomask plate and a supporting member. The patterned photomask plate has a pattern region and a peripheral region surrounding the pattern region. The patterned photomask plate includes a plurality of openings in the pattern region. The supporting member directly abuts the patterned photomask plate and is in a peripheral region of the patterned photomask plate. The supporting member is formed from a different material than the patterned photomask plate.

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First Claim

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTDHSINCHU

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chou, You-Hua Hsinchu, TW 118 1212
Chuang, Kuo-Sheng Hsinchu, TW 52 211

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