Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films

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United States of America

PATENT NO 11292938
APP PUB NO 20210071034A1
SERIAL NO

16567064

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Abstract

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A process for chemical mechanical polishing a substrate containing cobalt, zirconium oxide, poly-silicon and silicon dioxide, wherein the cobalt, zirconium, and poly-silicon removal rates are selective over silicon dioxide. The chemical mechanical polishing composition includes water, a benzyltrialkyl quaternary ammonium compound, cobalt chelating agent, corrosion inhibitor, colloidal silica abrasive, optionally a biocide and optionally a pH adjusting agent, and a pH greater than 7, and the chemical mechanical polishing compositions are free of oxidizing agents.

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Patent Owner(s)

Patent OwnerAddress
DUPONT ELECTRONIC MATERIALS HOLDING INC451 BELLEVUE ROAD NEWARK DE 19713

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Guo, Yi Newark, US 236 1263
Theivanayagam, Murali Ganth Newark, US 5 0
Van, Hanehem Matthew Richard Middletown, US 4 12

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