Mask blank, phase shift mask, and method of manufacturing semiconductor device

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11314161
APP PUB NO 20210048740A1
SERIAL NO

16980357

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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Provided is a mask blank for a phase shift mask including an etching stopper film. The mask blank has a structure where a transparent substrate has stacked thereon an etching stopper film and a phase shift film in this order, in which the phase shift film contains silicon and oxygen, in which the phase shift film has a refractive index n1 of 1.5 or more for light of 193 nm wavelength and an extinction coefficient k1 of 0.1 or less for light of 193 nm wavelength, in which the etching stopper film has a refractive index n2 of 2.5 or more and 3.1 or less for light of 193 nm wavelength and an extinction coefficient k2 of 0.4 or less for light of 193 nm wavelength, and the refractive index n2 and the extinction coefficient k2 satisfy at least one of a set of specified conditions.

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Patent Owner(s)

Patent OwnerAddress
HOYA CORPORATION6-10-1 NISHI-SHINJUKU SHINJUKU-KU TOKYO 160-8347

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shishido, Hiroaki Tokyo, JP 102 766
Taniguchi, Kazutake Tokyo, JP 9 10

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