Combination vacuum and over-pressure process chamber and methods related thereto

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United States of America Patent

PATENT NO 11367640
APP PUB NO 20200234986A1
SERIAL NO

16663319

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Abstract

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A process chamber system adapted for both vacuum process steps and steps at pressures higher than atmospheric pressure. The chamber door may utilize a double door seal which allows for high vacuum in the gap between the seals such that the sealing force provided by the high vacuum in the seal gap is higher than the opposing forces due to the pressure inside the chamber and the weight of the components.

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Patent Owner(s)

  • YIELD ENGINEERING SYSTEMS, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
McCoy, Craig Walter San Jose, US 11 9
Moffat, William San Jose, US 15 42

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