Method for selective delamination and transfer of thin film using liquid platform

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United States of America Patent

PATENT NO 11397382
APP PUB NO 20200387073A1
SERIAL NO

16736983

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Abstract

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Provided is a selective transfer method including depositing a thin film on a substrate; patterning the thin film using a laser or a tool to acquire a thin film of a target pattern; masking the thin film of the target pattern; selectively controlling a surface wettability through surface treatment of the masked thin film; delaminating the thin film of the target pattern by dipping a surface of the thin film with a wettability changed in response to a completion of the selective surface treatment into a liquid material and by applying a crack opening force capable of delaminating an interface between the thin film and the substrate; and immersing a target substrate into the liquid material when the thin film of the target pattern is floating in the liquid material and then scoop-up transferring the floating thin film of the target pattern.

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Patent Owner(s)

Patent OwnerAddress
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGYGUSEONG-DONG 291 DAEHAK-RO YUSEONG-GU DAEJEON 34141

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kang, Sumin Daejeon, KR 28 27
Kim, Taek-Soo Daejeon, KR 18 66

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