Plating method and plating apparatus

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United States of America Patent

PATENT NO 11447885
APP PUB NO 20210062354A1
SERIAL NO

17095138

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Abstract

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A plating method for plating a substrate having resist opening portions is provided. The plating method includes a resist residue removing step of removing resist residues in the resist opening portions of the substrate by spraying first process liquid to a surface of the substrate on which the resist opening portions are formed, a liquid filling step of soaking the substrate passed through the removing step in second process liquid to fill the resist opening portions of the substrate with the second process liquid, and a plating step of plating the substrate passed through the liquid filling step.

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Patent Owner(s)

Patent OwnerAddress
EBARA CORPORATIONTOKYO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujikata, Jumpei Tokyo, JP 67 666
Ishimoto, Kentaro Tokyo, JP 2 8
Miyamoto, Ryu Tokyo, JP 3 10
Shimoyama, Masashi Tokyo, JP 78 346

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