Polishing compositions and methods of use thereof

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11499071
APP PUB NO 20200224058A1
SERIAL NO

16832739

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Abstract

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The disclosure provides chemical mechanical polishing compositions and methods for polishing polysilicon films with high removal rates. The compositions include 1) an abrasive; 2) at least one compound of structure (I):

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM ELECTRONIC MATERIALS U S A INC80 CIRCUIT DRIVE NORTH KINGSTOWN RI 02852

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Leonov, Alexei P Gilbert, US 4 6
Mishra, Abhudaya Gilbert, US 32 182

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