Method of annealing reflective photomask by using laser
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United States of America Patent
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Nov 22, 2022
Grant Date -
Jul 22, 2021
app pub date -
Jun 25, 2020
filing date -
Jan 22, 2020
priority date (Note) -
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status (Latency Note)
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Abstract
A laser annealing method performed on a reflective photomask may include preparing a reflective photomask including a pattern area and a border area surrounding the pattern area and irradiating a laser beam onto the border area of the reflective photomask. The irradiating of the laser beam may include split-irradiating a plurality of laser beam spots onto the border area. Each of the plurality of laser beam spots may be shaped using a beam shaper. The beam shaper may include a blind area, a transparent area at a center of the blind area, and a semitransparent area between the blind area and the transparent area. Each of the plurality of laser beam spots may include a center portion passing through the transparent area and having a uniform energy profile and an edge portion passing through the semitransparent area and having an inclined energy profile.
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