Etchant composition and method for etching

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United States of America Patent

PATENT NO 11512397
SERIAL NO

17132560

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Abstract

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An etchant composition that is capable of batch etching treatment of a tungsten film and a titanium nitride film and a method for etching using said etchant composition are provided. The etching composition of the present invention is an etchant composition comprising nitric acid and water for batch etching treatment of a tungsten film and a titanium nitride film.

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Patent Owner(s)

Patent OwnerAddress
KANTO KAGAKU KABUSHIKI KAISHATOKYO 103-0023

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kouno, Ryou Saitama, JP 3 10
Ohwada, Takuo Saitama, JP 18 94

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