Patterning platinum by alloying and etching platinum alloy

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United States of America Patent

PATENT NO 11658034
APP PUB NO 20210242029A1
SERIAL NO

17234833

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Abstract

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There is provided a method of patterning platinum on a substrate. A platinum layer is deposited on the substrate, and a patterned photoresist layer is formed over the platinum layer leaving partly exposed regions of the platinum layer. An aluminum layer is deposited over the partly exposed regions of the platinum layer. An alloy is formed of aluminum with platinum from the partly exposed regions. The platinum aluminum alloy is etched away leaving a remaining portion of the platinum layer to form a patterned platinum layer on the substrate. In an embodiment, a thin hard mask layer is deposited on the platinum layer on the semiconductor substrate before the patterned photoresist layer is formed.

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Patent Owner(s)

Patent OwnerAddress
TEXAS INSTRUMENTS INCORPORATEDDALLAS TX

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Meier, Sebastian Bavaria, DE 33 21
Rinck, Helmut Bavaria, DE 18 57

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