Mask and method of forming the same

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United States of America Patent

PATENT NO 11662656
SERIAL NO

17100970

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Abstract

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A mask includes a substrate, a reflective multilayer, an absorption layer and an absorption part. The substrate includes a mask image region and a mask frame region, wherein the mask frame region has a mask black border region adjacent to the mask image region. The reflective multilayer is disposed over the substrate. The absorption layer is disposed over the reflective multilayer. The absorption part is disposed in the reflective multilayer and the absorption layer and in the mask black border region, wherein an entire top surface of the absorption part is substantially flush with a top surface of the absorption layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chun-Lang Tainan, TW 55 312
Chen, Jheng-Yuan Hsinchu, TW 5 5
Tu, Chih-Chiang Tauyen, TW 85 480
Yang, Shih-Hao Tainan, TW 14 20

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