Chemical mechanical polishing pad and preparation thereof

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11679531
APP PUB NO 20230112598A1
SERIAL NO

17500669

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Abstract

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The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is prepared by extruding a compounded photopolymerizable composition followed by exposure to UV light.

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Patent Owner(s)

Patent OwnerAddress
DUPONT ELECTRONIC MATERIALS HOLDING INC451 BELLEVUE ROAD NEWARK DE 19713

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Blomquist, Robert M River Edge, US 11 30
El-Sayed, Lyla M Boonton, US 19 179
Mills, Michael E Bear, US 41 469
Qian, Bainian Newark, US 54 363
Reddy, Kancharla-Arun Wilmington, US 2 1
Taylor, Bradley K West Chester, US 12 129
Xia, Shijing Hockessin, US 3 12

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