Plasma block with integrated cooling

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11710630
APP PUB NO 20210335603A1
SERIAL NO

16856282

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Abstract

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Exemplary semiconductor processing systems may include a remote plasma source. The remote plasma source may include a first plasma block segment defining an inlet to an internal channel of the first plasma block segment. The first plasma block segment may also define a cooling channel between the internal channel of the first plasma block segment and a first exterior surface of the first plasma block segment. The remote plasma source may include a second plasma block segment defining an outlet from an internal channel of the second plasma block segment. The second plasma block segment may also define a cooling channel between the internal channel of the second plasma block segment and a first exterior surface of the second plasma block segment. The systems may include a semiconductor processing chamber defining an inlet fluidly coupled with the outlet from the remote plasma source.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gondhalekar, Sudhir R Santa Clara, US 15 789
Gurjar, Tanmay P Santa Clara, US 1 2
Patankar, Sumit S Santa Clara, US 4 18

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