Polishing agent, polishing method, and liquid additive for polishing

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United States of America Patent

PATENT NO 11713404
APP PUB NO 20210261824A1
SERIAL NO

17318421

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Abstract

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The present invention relates to a polishing agent including: a water-soluble polymer including a copolymer of a monomer (A) which includes at least one member selected from the group consisting of an unsaturated dicarboxylic acid, a derivative thereof, and salts of the unsaturated dicarboxylic acid and the derivative thereof and a monomer (B) other than the monomer (A), comprising an ethylenic double bond and no acidic group; a cerium oxide particle; and water, in which the polishing agent has a pH of 4 to 9.

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Patent Owner(s)

Patent OwnerAddress
AGC INCTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Otsuki, Toshihiko Tokyo, JP 4 0

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