Mask blank, phase shift mask, and method of manufacturing semiconductor device
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United States of America Patent
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Aug 8, 2023
Grant Date -
N/A
app pub date -
Feb 6, 2020
filing date -
Feb 13, 2019
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Abstract
The phase shift film has a function to transmit an exposure light of a KrF excimer laser at a transmittance of 2% or more, and a function to generate a phase difference of 150 degrees or more and 210 degrees or less between the exposure light transmitted through the phase shift film and the exposure light transmitted through the air for a same distance as a thickness of the phase shift film, in which the phase shift film has a structure where a lower layer and an upper layer are stacked in order from a side of the transparent substrate, in which a refractive index nL of the lower layer at a wavelength of the exposure light and a refractive index nU of the upper layer at a wavelength of the exposure light satisfy a relation of nL>nU, in which an extinction coefficient kL of the lower layer at a wavelength of the exposure light and an extinction coefficient kU of the upper layer at a wavelength of the exposure light satisfy a relation of kL>kU; and in which a thickness dL of the lower layer and a thickness dU of the upper layer satisfy a relation of dL
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First Claim
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Patent Owner(s)
Patent Owner Address HOYA CORPORATION SHINJUKU-KU TOKYO 160-8347 International Classification(s)
Inventor(s)
Inventor Name
Address
# of filed Patents
Total Citations
Maeda, Hitoshi
Tokyo, JP
64
364
Nozawa, Osamu
Tokyo, JP
129
1014
Shishido, Hiroaki
Tokyo, JP
102
766
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