Method for optimizing radiation beam intensity profile shape using dual multiple aperture devices

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United States of America Patent

PATENT NO 11724129
SERIAL NO

17545030

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Abstract

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The present invention is directed to multiple aperture devices (MADs) for beam shaping in x-ray imaging. Two or more of these binary filters can be placed in an x-ray beam in series to permit a large number of x-ray fluence profiles. However, the relationship between particular MAD designs and the achievable fluence patterns is complex. The present invention includes mathematical and physical models that are used within an optimization framework to find optimal MAD designs. Specifically, given a set of target fluence patterns, the present invention finds, for example, a dual MAD design that is a “best fit” in generating the desired fluence patterns. This process provides a solution for both the design of MAD filters as well as the control actuation that is required (relative motion between MADs) that needs to be specified as part of the operation of a MAD-based fluence field modulation system.

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Patent Owner(s)

Patent OwnerAddress
THE JOHNS HOPKINS UNIVERSITY34TH AND CHARLES STREET BALTIMORE MD 21218

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Levinson, Reuven Haifa, IL 12 252
Mathews, Aswin John Baltimore, US 3 7
Stayman, Joseph Webster Baltimore, US 33 265

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