Polishing compositions and methods of use thereof

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United States of America Patent

PATENT NO 11732157
SERIAL NO

17063965

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Abstract

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A polishing composition includes an abrasive; an optional pH adjuster; a barrier film removal rate enhancer; a TEOS removal rate inhibitor; a cobalt removal rate enhancer; an azole-containing corrosion inhibitor; and a cobalt corrosion inhibitor.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM ELECTRONIC MATERIALS U S A INC80 CIRCUIT DRIVE NORTH KINGSTOWN RI 02852

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Shu-Wei Taoyuan, TW 36 231
Hu, Bin Chandler, US 275 1156
Liang, Yannan Gilbert, US 23 6
Wen, Liqing Mesa, US 13 26

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