Composition for removing ruthenium

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United States of America Patent

PATENT NO 11732365
SERIAL NO

17291256

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Abstract

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The present invention addresses the problem of providing a remover composition which can sufficiently remove ruthenium (Ru) remaining on substrates and can be inhibited from evolving RuO4 gas. The remover composition, which is for removing ruthenium remaining on substrates, has a pH at 25° C. of 8 or higher and includes one or more pH buffer ingredients.

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Patent Owner(s)

Patent OwnerAddress
KANTO KAGAKU KABUSHIKI KAISHATOKYO 103-0023

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kashiwagi, Itsuki Tokyo, JP 2 0
Ohwada, Takuo Tokyo, JP 18 94

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