Method for making photolithography mask plate

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United States of America Patent

PATENT NO 11747730
APP PUB NO 20210157239A1
SERIAL NO

17144312

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Abstract

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A method of making photolithography mask plate is provided. The method includes: providing a chrome layer on a substrate; depositing a carbon nanotube layer on the chrome layer to expose a part of a surface of the chrome layer; etching the chrome layer with the carbon nanotube layer as a mask to obtain a patterned chrome layer; and depositing a cover layer on the carbon nanotube layer.

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Patent Owner(s)

Patent OwnerAddress
HON HAI PRECISION INDUSTRY CO LTD66 CHUNG SHAN ROAD TU-CHENG DIST NEW TAIPEI 236
TSINGHUA UNIVERSITYHAIDIAN DISTRICT BEIJING 100084

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
An, Dong Beijing, CN 42 609
Chen, Mo Beijing, CN 106 604
Fan, Shou-Shan Beijing, CN 1514 11778
Jin, Yuan-Hao Beijing, CN 125 259
Li, Qun-Qing Beijing, CN 328 1764
Zhang, Li-Hui Beijing, CN 58 249

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