Method of manufacturing glass with hollow nanopillars and glass with hollow nanopillars manufactured thereby

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United States of America Patent

PATENT NO 11753297
APP PUB NO 20210163285A1
SERIAL NO

17078096

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Abstract

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The present invention relates to: a method of manufacturing glass with hollow nanopillars, which includes a silicon oxide layer forming step in which a silicon oxide layer made of silicon oxide is formed on one side of a glass substrate, a first etching step in which the silicon oxide layer is etched and a plurality of silicon oxide clusters are formed on the glass substrate, and a second etching step in which the glass substrate, on which the silicon oxide clusters are formed, is etched and hollow nanopillars are formed; and glass with hollow nanopillars manufactured thereby.

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Patent Owner(s)

Patent OwnerAddress
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYSEOUL 02792

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lee, Young A Seoul, KR 17 66
Moon, Myoung Woon Seoul, KR 27 57
Yoon, Sun Mi Seoul, KR 2 0

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