Method for producing high-purity electrolytic copper

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United States of America Patent

PATENT NO 11753733
APP PUB NO 20200181788A1
SERIAL NO

16617574

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Abstract

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In a method for producing high-purity electrolytic copper, a first additive (A) containing an aromatic ring of a hydrophobic group and a polyoxyalkylene group of a hydrophilic group, a second additive (B) formed of polyvinyl alcohols, and a third additive (C) formed of tetrazoles are added to a copper electrolyte, copper electrolysis is performed by controlling each concentration of the first additive (A), the second additive (B), and the third additive (C), a current density and a bath temperature, and accordingly, electrolytic copper in which a concentration of Ag is less than 0.2 mass ppm, a concentration of S is less than 0.07 mass ppm, a concentration of all impurities is less than 0.2 mass ppm, and an area ratio of crystal grains having an average crystal grain misorientation (referred to as a GOS value) exceeding 2.5° is 10% or less is obtained.

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Patent Owner(s)

  • MITSUBISHI MATERIALS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arai, Isao Naka, JP 31 309
Kubota, Kenji Naka, JP 70 623
Nakaya, Kiyotaka Naka, JP 36 39
Tarutani, Yoshie Naka, JP 22 34

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