Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method

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United States of America Patent

PATENT NO 11787894
APP PUB NO 20210087325A1
SERIAL NO

17107016

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Abstract

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A Schiff base-containing chain extender may be a diol having a Schiff base or a derivative thereof, as well as a polyurethane produced using the same and a modification method thereof, and a polishing layer including a polyurethane and a polishing method using the polishing layer.

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Patent Owner(s)

Patent OwnerAddress
KURARAY CO LTDKURASHIKI-SHI OKAYAMA 710-0801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kato, Mitsuru Kurashiki, JP 67 674
Kato, Shinya Chiyoda-ku, JP 89 518
Okamoto, Chihiro Kurashiki, JP 23 98
Oshita, Azusa Kurashiki, JP 4 3
Takegoshi, Minori Kurashiki, JP 12 38

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