Substrate liquid processing apparatus, substrate liquid processing method and recording medium
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United States of America Patent
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Oct 24, 2023
Grant Date -
Jan 7, 2021
app pub date -
Nov 22, 2018
filing date -
Nov 28, 2017
priority date (Note) -
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Abstract
A substrate processing apparatus includes a substrate holder configured to horizontally hold and rotate a substrate which has a recess and a base metal layer exposed from a bottom surface of the recess; and a pre-cleaning liquid supply configured to supply a pre-cleaning liquid such as dicarboxylic acid or tricarboxylic acid onto the substrate being held and rotated by the substrate holder, to thereby pre-clean the base metal layer. A temperature of the pre-cleaning liquid on the substrate is equal to or higher than 40° C.
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