Substrate processing method, recording medium and substrate processing apparatus
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United States of America Patent
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Dec 19, 2023
Grant Date -
Mar 4, 2021
app pub date -
Sep 2, 2020
filing date -
Sep 3, 2019
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate processing method includes supplying a developing liquid configured to form a resist pattern onto a surface of a substrate on which a resist film is formed; performing multiple cycles of a cleaning processing of supplying a modifying liquid containing a modifying agent having a hydrophilic group onto the surface of the substrate on which the resist pattern is formed and supplying a rinse liquid configured to remove the modifying liquid onto the surface of the substrate; and drying the surface of the substrate after performing the multiple cycles of the cleaning processing.
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