System for processing substrate

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United States of America Patent

PATENT NO 11856680
APP PUB NO 20210360767A1
SERIAL NO

17243954

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Abstract

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A substrate processing system capable of setting a stable reference ground level for electrical components while handling electrostatic discharge (ESD) is provided. The substrate processing system includes a first ground bar connected to a building ground; and a second ground bar connected to the building ground and physically separated from the first ground bar, wherein the first ground bar is connected to a first electrical component to set a ground level of the first electrical component, wherein the second ground bar is dedicated to a charged component, and the second ground bar is connected to the first charged component to set a path of the electrostatic discharge current generated by the first charged component.

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Patent Owner(s)

Patent OwnerAddress
SEMES CO LTD77 4SANDAN 5-GIL JIKSAN-EUP SEOBUK-GU CHEONAN-SI CHUNGCHEONGNAM-DO 18489

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jeon, Byung Du Chungcheongnam-do, KR 1 1
Kim, Sun Whan Gyeonggi-do, KR 7 39

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