Liquid supply unit, and apparatus and method for processing substrate

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United States of America Patent

PATENT NO 11869778
APP PUB NO 20210202274A1
SERIAL NO

17137233

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Abstract

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An apparatus for processing a substrate includes a housing, a support unit that supports the substrate in the housing, a nozzle that dispenses a processing liquid onto the substrate, and a liquid supply unit that supplies the processing liquid to the nozzle. The liquid supply unit includes a container having a storage space in which the processing liquid is stored, a liquid supply tube through which the processing liquid flows from the container to the nozzle, and an ultrasonic-wave application member that applies ultrasonic waves to the processing liquid before the processing liquid is supplied to the nozzle. The ultrasonic-wave application member includes a liquid reservoir having an interior space in which a liquid is received and an ultrasonic generator that applies ultrasonic waves to the liquid received in the liquid reservoir. Part of the liquid supply tube is immersed in the liquid received in the liquid reservoir.

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Patent Owner(s)

Patent OwnerAddress
SEMES CO LTD77 4SANDAN 5-GIL JIKSAN-EUP SEOBUK-GU CHEONAN-SI CHUNGCHEONGNAM-DO 31040

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Gi Hun Gyeongsangnam-do, KR 9 4
Jung, Buyoung Chungcheongnam-do, KR 7 8
Park, Gui Su Chungcheongnam-do, KR 19 20
Yang, Seungtae Gyeonggi-do, KR 8 3

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