Substrate for pattern formation

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United States of America Patent

PATENT NO 11898008
APP PUB NO 20200231748A1
SERIAL NO

16624128

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Abstract

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A substrate for pattern formation, the substrate including at least a base material and a perfluoro(poly)ether group-containing silane compound-derived portion, wherein the base material includes at least one main face having a first region and a second region which is a region for pattern formation, adjacent to the first region, and the perfluoro(poly)ether group-containing silane compound-derived portion is disposed in the first region.

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Patent Owner(s)

Patent OwnerAddress
DAIKIN INDUSTRIES LTDOSAKA-SHI OSAKA 530-8323

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honda, Yoshiaki Osaka, JP 97 962

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