Substrate processing liquid for etching a metal layer, substrate processing method and substrate processing apparatus

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United States of America Patent

PATENT NO 11908938
APP PUB NO 20210288172A1
SERIAL NO

17191841

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Abstract

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A substrate processing liquid is used to etch a substrate in which at least either a bottom wall or a side wall forming a trench structure is an etched layer made of metal or a metal compound. The substrate processing liquid includes a chemical liquid containing H2O2 molecules or HO2− functioning as an etchant for etching the metal, and a complex forming agent containing NH4+ and forming a complex with ions of the metal and is adjusted to a pH of 5 or more.

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Patent Owner(s)

Patent OwnerAddress
SCREEN HOLDINGS CO LTDTENJINKITA-MACHI 1-1 TERANOUCHI-AGARU 4-CHOME HORIKAWA-DORI KAMIGYO-KU KYOTO-SHI KYOTO 602-8585

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hanawa, Yosuke Kyoto, JP 21 65
Ueda, Dai Kyoto, JP 14 82

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