Plasma processing apparatus and plasma processing method

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United States of America

PATENT NO 11923170
SERIAL NO

17311183

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Abstract

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The plasma processing apparatus according to an exemplary embodiment includes a processing container, a stage, an upper electrode, a dielectric plate, and a waveguide. The stage is provided in the processing container. The dielectric plate is provided above the stage with a space in the processing container interposed therebetween. The upper electrode is provided above the dielectric plate. The waveguide has an end and guides high frequency waves in a VHF band or a UHF band. The end is arranged to face the space to radiate high frequency waves to the space. The dielectric plate includes a conductive film. The conductive film is provided on an upper surface of the dielectric plate. The upper surface faces the upper electrode. The conductive film is electrically connected to the upper electrode.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO 107-6325
TOHOKU UNIVERSITYSENDAI-SHI MIYAGI 980-8577

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirayama, Masaki Tokyo, JP 135 4253
Ikeda, Taro Nirasaki, JP 172 3298
Kawakami, Satoru Nirasaki, JP 78 1427
Yamamoto, Hiroyuki Nirasaki, JP 339 6151

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