Methods of forming nanostructures utilizing self-assembled nucleic acids
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United States of America Patent
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Mar 5, 2024
Grant Date -
Aug 18, 2022
app pub date -
Apr 25, 2022
filing date -
Jan 9, 2014
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Abstract
A method of forming a structure comprises forming a pattern of self-assembled nucleic acids over a material. The pattern of self-assembled nucleic acids is exposed to at least one repair enzyme to repair defects in the pattern. The repaired pattern of self-assembled nucleic acids is transferred to the material to form features therein. A method of decreasing defect density in self-assembled nucleic acids is also disclosed. Self-assembled nucleic acids exhibiting an initial defect density are formed over at least a portion of a material and the self-assembled nucleic acids are exposed to at least one repair enzyme to repair defects in the self-assembled nucleic acids. Additional methods are also disclosed.
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