Rocker polishing apparatus and method for full-aperture deterministic polishing of a planar part

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United States of America

PATENT NO 11945070
APP PUB NO 20220305604A1
SERIAL NO

17289718

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Abstract

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A rocker polishing apparatus for full-aperture deterministic polishing of a planar part includes a control system, a substrate, a lifting plate, a polishing module and a measuring module. The polishing module and the measuring module are arranged on the substrate. The lifting plate is arranged between the polishing module and the measuring module. The polishing module includes a rocker mechanism, a polishing pad surface dressing mechanism, a polishing pad surface profile measuring apparatus and a continuous polishing pad mechanism. The apparatus allows the material removal rate distribution of the planar part and the surface profile of the planar part be in the normalized mirror symmetry relationship by controlling the material removal rate distribution on the surface of the planar part, thereby implementing the deterministic polishing of the planar part and ensuring the efficient convergence of the surface profile of the planar part in the polishing process.

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Patent Owner(s)

Patent OwnerAddress
DALIAN UNIVERSITY OF TECHNOLOGYNO 2 LINGGONG ROAD HI-TECH DISTRICT DALIAN LIAONING DALIAN 116024

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Geng, Zhichao Liaoning, CN 1 0
Guo, Dongming Liaoning, CN 17 10
Wang, Kai Liaoning, CN 565 3689
Wang, Lin Liaoning, CN 481 3933
Yan, Ying Liaoning, CN 93 736
Zhou, Ping Liaoning, CN 228 1742

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