Cleaning apparatus and polishing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11948811
APP PUB NO 20210202273A1
SERIAL NO

17128643

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A cleaning apparatus includes: a cleaning tank that defines a cleaning space for cleaning a wafer; a wafer rotation mechanism that is arranged inside the cleaning tank and holds and rotates the wafer; a cleaning member that contacts and cleans a surface of the wafer, is rotatable around a central axis extending in a lateral direction, and has a length in an axial direction longer than a radius of the wafer; a swing mechanism that swings the cleaning member around a swing axis located inside the cleaning tank to move the cleaning member from a retracted position outside of the wafer to a cleaning position directly above the wafer; a second cleaning means that cleans the surface of the wafer; and a second swing mechanism that swings the second cleaning means around a second swing axis located inside the cleaning tank to pass directly above a center of the wafer.

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Patent Owner(s)

Patent OwnerAddress
EBARA CORPORATIONOTA-KU TOKYO 144-8510

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujimoto, Tomoaki Tokyo, JP 7 1
Fukaya, Koichi Tokyo, JP 30 241
Inoue, Takuya Tokyo, JP 158 949
Miyazaki, Mitsuru Tokyo, JP 83 501
Oikawa, Fumitoshi Tokyo, JP 20 121

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