Deposition device and deposition method

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United States of America Patent

PATENT NO 11958073
APP PUB NO 20230219114A1
SERIAL NO

18151482

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Abstract

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According to one embodiment, a deposition method includes preparing a processing substrate in which a lower electrode, a rib, and a partition including a lower portion and an upper portion arranged on the lower portion and protruding from a side surface of the lower portion are formed above a substrate, setting a spread angle of vapor of a first material emitted from a first deposition head to a first angle, and depositing the first material on the processing substrate, and setting a spread angle of vapor of a second material emitted from a second deposition head to a second angle larger than the first angle, and depositing the second material on the processing substrate on which the first material is deposited.

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Patent Owner(s)

Patent OwnerAddress
JAPAN DISPLAY INC3-7-1 NISHI-SHINBASHI MINATO-KU TOKYO 105-0003

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Takeda, Atsushi Tokyo, JP 93 1060
Takenaka, Takanobu Tokyo, JP 19 18

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