Atomic layer etch and deposition processing systems including a lens circuit with a tele-centric lens, an optical beam folding assembly, or a polygon scanner

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United States of America Patent

PATENT NO 11984330
APP PUB NO 20210143032A1
SERIAL NO

17053110

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Abstract

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A substrate processing system includes a processing chamber, a substrate support, a laser, and a collimating assembly. The substrate support is disposed in the processing chamber and is configured to support a substrate. The laser is configured to generate a laser beam. The collimating assembly includes lenses or mirrors arranged to direct the laser beam at the substrate to heat an exposed material of the substrate. The lenses or mirrors are configured to direct the laser beam in a direction within a predetermined range of being perpendicular to a surface of the substrate.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Yunsang S Monte Sereno, US 5 19
Paeng, Dong Woo Albany, US 8 3
Schoepp, Alan M Ben Lomond, US 40 1631
Wells, Keith Santa Cruz, US 17 603
Zhang, He Fremont, US 125 342

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