Wafer boat handling device, vertical batch furnace and method
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United States of America Patent
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May 28, 2024
Grant Date -
Nov 19, 2020
app pub date -
May 14, 2020
filing date -
May 16, 2019
priority date (Note) -
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status (Latency Note)
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Abstract
A wafer boat handling device, configured to be positioned under a process chamber of a vertical batch furnace. The wafer boat handling device comprises a main housing having a wall defining and bounding a wafer boat handling space, and a boat transporter comprising a wafer boat support for supporting a wafer boat and configured to transport the wafer boat to a cooldown position within the wafer boat handling space. A part of the wall adjacent the cooldown position is a wall part with a heat radiation surface absorptance of at least 0.60 so as to withdraw heat from the wafer boat which is in the cooldown position by means of heat radiation absorption.
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