Deep trench capacitor including a compact contact region and methods of forming the same

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United States of America Patent

PATENT NO 12009405
APP PUB NO 20230069774A1
SERIAL NO

17460178

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Abstract

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A deep trench capacitor includes at least one deep trench and a layer stack including at least three metallic electrode layers interlaced with at least two node dielectric layers and continuously extending over the top surface of a substrate and into each of the at least one deep trench. A contact-level dielectric layer overlies the substrate and the layer stack. Contact assemblies extend through the contact-level dielectric layer. A subset of the contact assemblies vertically extend through a respective metallic electrode layer. For example, a first contact assembly includes a first tubular insulating spacer that laterally surrounds a first contact via structure and contacts a cylindrical sidewall of a topmost metallic electrode layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITEDNO 8 LI-HSIN 6 ROAD HSINCHU SCIENCE PARK HSINCHU ROC 30077

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Jen-Yuan Hsinchu, TW 175 215
Lai, Chia-Ping Hsinchu, TW 107 114
Lee, Chien-Chang Miaoli County, TW 58 157

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