Ultralow-gloss PC/ABS resin composition and preparation method thereof

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United States of America Patent

PATENT NO 12018148
APP PUB NO 20210238412A1
SERIAL NO

17050451

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Abstract

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An ultralow-gloss polycarbonate/acrylonitrile-butadiene-styrene (PC/ABS) resin composition and a preparation method thereof are provided. The composition includes the following components: 40-80 parts by weight of bisphenol A polycarbonate, 19-40 parts by weight of acrylonitrile-butadiene-styrene graft copolymer, 1-20 parts by weight of ultralow-gloss toughening modifier, and 0.1-5 parts of processing aid. The ultralow-gloss toughening modifier includes the following components: post-treated polymeric microspheres, a low-temperature toughening agent, a coupling agent, and aid. The preparation method of the composition includes: fully mixing all components in a high-speed mixer to obtain a mixture; feeding the mixture into a main feed port from a twin-screw extruder, melting, extruding, cooling, drying, and pelletizing. The PC/ABS resin composition prepared by the present invention has extremely low gloss level and excellent impact toughness, and it can be applied in scenarios requiring low temperature resistance and low gloss level.

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Patent Owner(s)

Patent OwnerAddress
SHANGHAI KUMHOSUNNY PLASTICS CO LTD201109 1ST FLOOR BUILDING 2 NO 1299 PING'AN ROAD MINHANG DISTRICT SHANGHAI SHANGHAI CITY SHANGHAI CITY 201109

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Li, Qiang Shanghai, CN 872 12045
Qin, Huilin Shanghai, CN 1 1
Xin, Minqi Shanghai, CN 11 24

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