Method for drying a substrate, dryer module for carrying out the method, and dryer system

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United States of America Patent

PATENT NO 12025375
APP PUB NO 20200300542A1
SERIAL NO

16766857

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Abstract

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Methods for drying a substrate. The methods include the following steps: (a) emitting infrared radiation towards a substrate moving through a process space using an emitter unit comprising at least one inflated emitter, (b) generating at least two process gas streams of a process gas directed towards the substrate, (c) drying the substrate by the action of infrared radiation and process gas on the substrate, and (d) extracting moisture-laden process gas from the process space via an extraction duct, forming an exhaust air stream leading away from the substrate. To specify a drying method which is reproducible and effective and leads to an improved result, in particular in terms of homogeneity and speed of drying of the substrate, the at least two process gas streams are guided to the infrared emitter before they act on the substrate, and an exhaust air stream is spatially assigned to each process gas stream.

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Patent Owner(s)

Patent OwnerAddress
EXCELITAS NOBLELIGHT GMBHHERAEUSSTR 12-14 HANAU 63450

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Graziel, Bernhard Hanau, DE 4 88
Krafft, Vincent Hanau, DE 4 1
Tittmann, Michael Hanau, DE 9 21
Von, Riewel Larisa Hanau, DE 16 11

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