Apparatus for supplying gas including an ion chamber and a gas supply unit connected to the ion chamber

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United States of America

PATENT NO 12030775
SERIAL NO

17208331

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Abstract

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An apparatus for supplying gas includes: an ion chamber; and a gas supply unit connected to the ion chamber, wherein the gas supply unit includes: a case having an internal space; an inactive gas supply unit connected to the ion chamber; and a hydrogen gas supply unit installed inside or outside of the case, wherein the hydrogen gas supply unit includes: a hydrogen gas generator generating hydrogen gas; a controller connected to the hydrogen gas generator; a dehumidifying filter connected to the controller and removing moisture from the hydrogen gas; and a purifying filter connected to the dehumidifying filter and removing an impurity from the hydrogen gas, wherein the hydrogen gas generator is configured to generate the hydrogen gas through a chemical reaction between a reactant and a hydrogen-containing solid raw material.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDSUWON-SI GYEONGGI-DO 16677

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bak, Ungi Suwon-si, KR 1 0
Jung, Ui Yong Hwaseong-si, KR 1 0
Kim, Young Kwon Hwaseong-si, KR 36 167
Lee, Jonghyun Seoul, KR 59 322
Lee, Sang Jin Suwon-si, KR 195 1011

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