Substrate processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12036585
APP PUB NO 20210229135A1
SERIAL NO

17158354

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Abstract

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A substrate processing apparatus includes an air supply configured to supply air into a place where a substrate is located; and a rectifying member, having multiple through holes, configured to rectify the air supplied from the air supply. The rectifying member includes a base; and a charge diffusion layer formed on a surface of the base. Electric charges attached to a surface of the rectifying member are diffused along the charge diffusion layer.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED107-6325 MINATO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukuda, Yoshiteru Koshi, JP 18 109
Iino, Tadashi Koshi, JP 80 1977

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