Substrate treatment apparatus and substrate treatment method

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United States of America Patent

PATENT NO 12046487
APP PUB NO 20210265181A1
SERIAL NO

17315830

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Abstract

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According to embodiments, a substrate treatment apparatus includes a housing, a heater and a pipe. The housing stores solution containing phosphoric acid and houses a substrate including a silicon substrate. The heater heats the solution over a normal boiling point of the solution. The pipe supplies heated solution heated by the heater into the housing while generating air bubbles.

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Patent Owner(s)

Patent OwnerAddress
KIOXIA CORPORATION1-21 SHIBAURA 3-CHOME MINATO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ashidate, Hiroaki Mie, JP 25 86
Kitamura, Yoshinori Tsu, JP 38 346
Sato, Katsuhiro Yokkaichi, JP 153 947

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