Endpoint detection in low open area and/or high aspect ratio etch applications

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United States of America Patent

PATENT NO 12046522
APP PUB NO 20230268235A1
SERIAL NO

17675900

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Abstract

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Disclosed herein is a method for determining the endpoint of an etch operation used for forming high aspect ratio features and/or over low open area (<1%) on a substrate in a processing chamber. The method begins by obtaining a reference emission curve. An etch operation is performed on a patterned substrate. A plasma optical emission intensity is measured for each of the etch cycles. A differential curve between the reference emission and the plasma optical emissions is calculated. And endpoint is determined for the etch operation on the first substrate based on an inflection point detection or other unique features through pattern recognition in the differential curve for stopping the etch of the first substrate.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Koseki, Shinichi santa Clara, US 6 326
Lian, Lei Fremont, US 71 497
Walker, Quentin Santa Clara, US 3 28
Wang, Zefang Santa Clara, US 4 2

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