Substrate processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12051605
SERIAL NO

17495833

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Abstract

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A substrate processing apparatus includes a fluid supply unit that supplies a fluid that includes a pressurized vapor or mist of a purified water, a processing liquid supply unit that supplies a processing liquid that includes at least sulfuric acid, and a nozzle that includes a first discharge port that discharges a fluid that is supplied from the fluid supply unit, a second discharge port that discharges a processing liquid that is supplied from the processing liquid supply unit, and a guiding route that is communicated with the first discharge port and the second discharge port and guides a mixed fluid of a fluid that is discharged from the first discharge port and a processing liquid that is discharged from the second discharge port, where a cross-sectional area of the guiding route is greater than a cross-sectional area of the first discharge port.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Goto, Daisuke Kumamoto, JP 176 722
Hashimoto, Yusuke Kumamoto, JP 97 429
Koga, Takahiro Kumamoto, JP 13 445
Mori, Kanta Kumamoto, JP 9 66
Ogata, Nobuhiro Kumamoto, JP 43 248
Sakurai, Hiroki Kumamoto, JP 33 215

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