Mask, method for fabricating mask and drive-backplane motherboard

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United States of America

PATENT NO 12052907
SERIAL NO

17297520

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Abstract

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Provided is a mask, including: a plurality of mask pattern regions, a transition region disposed between the plurality of mask pattern regions, and a mask marginal region surrounding the plurality of mask pattern regions and the transition region; wherein the transition region includes at least one first half-etched sub-region with a thickness less than a thickness of the mask marginal region.

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Patent Owner(s)

  • CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.; BOE TECHNOLOGY GROUP CO. LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ji, Fengli Beijing, CN 84 315
Xu, Peng Beijing, CN 685 5136

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